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Chiller In The Vacuum Coating Process What Is The Role?
- Mar 06, 2018 -

IF vacuum coating machine generally with a chiller as coating machine (mainly cylindrical target) cooling equipment. So chillers in the end of the vacuum coating process or coating equipment What is the role? Unfair chilled water have any effect?

Chiller in the vacuum coating process What is the role?

The principle of vacuum coating is that the film body evaporates and falls on the surface of the workpiece at high temperature. As the air on the evaporation of the film body molecules will have a resistance to collision caused the crystal becomes rough and matte, it must be under high vacuum in order to make the crystal fine and bright, if the vacuum is not high, the crystal will lose luster bond is also poor. Early vacuum coating is to rely on the evaporation of the natural scattering, combined with poor efficiency low gloss. Now coupled with magnetron sputtering target magnetron sputtering target membrane will evaporate molecules in the film under the action of the electric field to accelerate the bombardment target, sputtering a large number of target atoms, the neutral target atoms (or molecules) deposited in Film on the substrate, to solve the past can not be processed by natural evaporation membrane species, such as titanium coated zirconium and so on.


IF equipment must add cooling water, because of its high frequency of large current. Current flow in the conductor when there is a skin effect, the charge will gather in the conductance of the surface area, so that the conductance of heat conduction in the middle of the tube to do with water cooling.


(Mainly cylindrical target) Why water cooling? Magnetron Sputtering Targets generate a high temperature when fired and can deform the gun so it has a water jacket to cool the gun. At the same time there is an important reason magnetron sputtering can be considered as one of the most prominent achievements in coating technology. It is high sputtering rate, substrate temperature rise, film-based bonding strength.


From a deeper study of the motion of electrons in a non-uniform electromagnetic field, the general principle of magnetron sputtering and the transverse inhomogeneity and symmetry of the magnetic field are discussed. Magnetron sputtering can be considered as one of the most prominent achievements in coating technology. It is high sputtering rate, substrate temperature rise, membrane-based bonding strength, device performance and stability.


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